Exclusive

Publication

Byline

Location

US Patent Issued to Coretronic on April 14 for "Wavelength conversion module and projector" (Taiwanese Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,966, issued on April 14, was assigned to Coretronic Corp. (Hsin-Chu, Taiwan). "Wavelength conversion module and projector" was invented by... Read More


US Patent Issued to MAXELL on April 14 for "Information display system having acute-angled diffusion characteristics and image light control film used for the same" (Japanese Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,967, issued on April 14, was assigned to MAXELL LTD. (Kyoto, Japan). "Information display system having acute-angled diffusion characteris... Read More


US Patent Issued to Carl Zeiss SMT on April 14 for "Method and apparatus for processing a sample" (German Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,968, issued on April 14, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany). "Method and apparatus for processing a sample" was inv... Read More


US Patent Issued to CANON on April 14 for "Molding apparatus, molding method, and article manufacturing method" (Japanese Inventor)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,969, issued on April 14, was assigned to CANON K.K. (Tokyo). "Molding apparatus, molding method, and article manufacturing method" was inv... Read More


US Patent Issued to HD MICROSYSTEMS on April 14 for "Photosensitive resin composition, method for manufacturing patterned cured product, cured product, interlayer insulating film, cover coat layer, surface protective film, and electronic component" (Japanese Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,970, issued on April 14, was assigned to HD MICROSYSTEMS LTD. (Tokyo). "Photosensitive resin composition, method for manufacturing pattern... Read More


US Patent Issued to ZEON on April 14 for "Negative photosensitive resin composition" (Japanese Inventor)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,971, issued on April 14, was assigned to ZEON Corp. (Tokyo). "Negative photosensitive resin composition" was invented by Takashi Tsutsumi ... Read More


US Patent Issued to Semes on April 14 for "System for supplying photoresist and method for managing photoresist" (South Korean Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,973, issued on April 14, was assigned to Semes Co. LTD. (Cheonan-si, South Korea). "System for supplying photoresist and method for managi... Read More


US Patent Issued to Lam Research on April 14 for "Bake strategies to enhance lithographic performance of metal-containing resist" (California Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,974, issued on April 14, was assigned to Lam Research Corp. (Fremont, Calif.). "Bake strategies to enhance lithographic performance of met... Read More


US Patent Issued to Lam Research on April 14 for "All-in-one dry development for metal-containing photoresist" (California Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,976, issued on April 14, was assigned to Lam Research Corp. (Fremont, Calif.). "All-in-one dry development for metal-containing photoresis... Read More


US Patent Issued to UNITED MICROELECTRONICS on April 14 for "Optimization method for mask pattern optical transfer" (Taiwanese Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,977, issued on April 14, was assigned to UNITED MICROELECTRONICS CORP. (Hsinchu, Taiwan). "Optimization method for mask pattern optical tr... Read More